Progressive heating of components of substrate processing systems using TCR element-based heaters
US11183400B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2018 |
| Grant date | Nov 23, 2021 |
| Priority date | — |
| Expiry date | Aug 12, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24585
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A heater control system for heating components of a substrate processing system includes N heater zones, where N is an integer greater than zero. Each of the N heater zones heats a component of the substrate processing system and includes a resistive heater and a temperature sensor to sense a local temperature in a corresponding one of the N heater zones. A controller is configured to determine an average temperature of each of the N heater zones based on a resistance of the resistive heater in each of the N heater zones. The controller controls the resistive heater based on the average temperature and the local temperature in each of the N heater zones.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.