Easwar Srinivasan
34Patents
15h-index
37Co-inventors
77Inventor score
Filing activity: Mar 11, 2004 → Jul 12, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7265061B1 | Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties | Electricity | 573 | Expired |
| US8728956B2 | Plasma activated conformal film deposition | Electricity | 520 | Active |
| US7906174B1 | PECVD methods for producing ultra low-k dielectric films using UV treatment | Electricity | 478 | Active |
| US8592328B2 | Method for depositing a chlorine-free conformal sin film | Electricity | 105 | Active |
| US7253125B1 | Method to improve mechanical strength of low-k dielectric film using modulated UV exposure | Electricity | 68 | Expired |
| US8137467B2 | Temperature controlled showerhead | Chemistry; Metallurgy | 46 | Active |
| US10121689B2 | Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing | Electricity | 41 | Active |
| US9230800B2 | Plasma activated conformal film deposition | Electricity | 40 | Active |
| US7611757B1 | Method to improve mechanical strength of low-K dielectric film using modulated UV exposure | Electricity | 32 | Active |
| US7622400B1 | Method for improving mechanical properties of low dielectric constant materials | Electricity | 32 | Expired |
| US8673080B2 | Temperature controlled showerhead | Electricity | 32 | Active |
| US9070555B2 | Method for depositing a chlorine-free conformal sin film | Electricity | 29 | Active |
| US7695765B1 | Methods for producing low-stress carbon-doped oxide films with improved integration properties | Electricity | 18 | Active |
| US9960068B1 | Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing | Electricity | 16 | Active |
| US8043667B1 | Method to improve mechanical strength of low-K dielectric film using modulated UV exposure | Electricity | 16 | Active |
| US9670579B2 | Method for depositing a chlorine-free conformal SiN film | Electricity | 15 | Active |
| US9476120B2 | Temperature controlled showerhead | Electricity | 13 | Active |
| US9892956B1 | Wafer positioning pedestal for semiconductor processing | Electricity | 12 | Active |
| US8715788B1 | Method to improve mechanical strength of low-K dielectric film using modulated UV exposure | Electricity | 8 | Active |
| US10020220B2 | Wafer positioning pedestal for semiconductor processing | Electricity | 7 | Active |
| US10221484B2 | Temperature controlled showerhead | Electricity | 6 | Active |
| US10699937B2 | Wafer positioning pedestal for semiconductor processing | Electricity | 5 | Active |
| US10354909B2 | Wafer positioning pedestal for semiconductor processing | Electricity | 4 | Active |
| US10870922B2 | Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing | Electricity | 3 | Active |
| US11183400B2 | Progressive heating of components of substrate processing systems using TCR element-based heaters | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.