Methods of guiding process models and inspection in a manufacturing process
US11183434B2 · kind B2 · utility
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6References
21Claims
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Key dates
| Filing date | Dec 13, 2017 |
| Grant date | Nov 23, 2021 |
| Priority date | — |
| Expiry date | Jun 22, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method where deviations of a characteristic of an image simulated by two different process models or deviations of the characteristic simulated by a process model and measured by a metrology tool, are used for various purposes such as to reduce the calibration time, improve the accuracy of the model, and improve the overall manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.