Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror

US11187990B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Johannes Lippert · Buch am Wald, DE
• Toralf Gruner · Hennef (Sieg), DE
• Kerstin Hild · Schwäbisch Gmünd, DE
• Philip Lucke · Bad Iburg, DE
• Mohammadreza Nematollahi · Eindhoven, NL

Key dates

• Filing date: Jan 26, 2021
• Grant date: Nov 30, 2021
• Expiry date: Jan 26, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/067
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A mirror for a microlithographic projection exposure apparatus, and a method for operating a deformable mirror. In one aspect, a mirror includes an optical effective surface (11), a mirror substrate (12), a reflection layer stack (21) for reflecting electromagnetic radiation incident on the optical effective surface, and at least one piezoelectric layer (16) arranged between the mirror substrate and the reflection layer stack and to which an electric field for producing a locally variable deformation is able to be applied by a first electrode arrangement situated on the side of the piezoelectric layer (16) facing the reflection layer stack, and by a second electrode arrangement situated on the side of the piezoelectric layer facing the mirror substrate. The piezoelectric layer has a plurality of columns spatially separated from one another by column boundaries, wherein a mean column diameter of the columns is in the range of 0.1 μm to 50 μm.