Method for mask and substrate alignment
US11189516B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2020 |
| Grant date | Nov 30, 2021 |
| Priority date | — |
| Expiry date | Apr 9, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/40
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods and apparatuses for aligning masks with substrates are provided. A method can include receiving a carrier having a substrate disposed thereon at an alignment stage of an alignment module, transferring a mask from a mask cassette of a mask stocker of the alignment module to a position over the alignment stage, and positioning the mask on the carrier. The method can also include acquiring one or more images of the mask and the substrate, where the mask contains one or more alignment holes passing through the mask and the substrate contains one or more alignment dots disposed on an upper surface of the substrate, analyzing the one or more images to determine one or more differences between one or more alignment holes of the mask and one or more alignment dots on the substrate, and aligning the mask with the substrate based on the differences.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.