Lithographic process and apparatus and inspection process and apparatus
US11199782B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 22, 2017 |
| Grant date | Dec 14, 2021 |
| Priority date | — |
| Expiry date | Sep 6, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7026
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.