Charged particle beam apparatus
US11211224B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2018 |
| Grant date | Dec 28, 2021 |
| Priority date | — |
| Expiry date | Apr 26, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/281
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.