Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method
US11215506B2 · kind B2 · utility
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7References
5Claims
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Key dates
| Filing date | Jan 29, 2021 |
| Grant date | Jan 4, 2022 |
| Priority date | — |
| Expiry date | Jan 29, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2003/2866
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate processing module includes a process chamber configured to perform a treatment process on a substrate; a transfer chamber provided on a first side of the process chamber, the substrate being transferred between the process chamber and the transfer chamber; an optical emission spectroscopy (OES) system provided on a second side of the process chamber and configured to monitor the process chamber; and a reference light source disposed in the transfer chamber and configured to emit a reference light to calibrate the OES system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.