Jongwoo Sun
20Patents
1h-index
49Co-inventors
49Inventor score
Filing activity: Jun 13, 2016 → Apr 10, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11264291B2 | Sensor device and etching apparatus having the same | Electricity | 5 | Active |
| US10643858B2 | Method of etching substrate | Electricity | 1 | Active |
| US12087554B2 | Substrate treating apparatus and substrate treating system having the same | Electricity | 0 | Active |
| US12315703B2 | Plasma processing apparatus and methods of manufacturing semiconductor device using the same | Electricity | 0 | Active |
| US11251022B2 | Gas supply assembly and substrate processing apparatus including the same | Electricity | 0 | Active |
| US11348760B2 | Plasma processing apparatus and method of manufacturing semiconductor device using the same | Electricity | 0 | Active |
| US12211672B2 | Apparatus and method for plasma etching | Electricity | 0 | Active |
| US10892145B2 | Substrate processing apparatus, substrate processing method, and method of fabricating semiconductor device using the same | Electricity | 0 | Active |
| US12068140B2 | Method and system for monitoring substrate processing apparatus | Electricity | 0 | Active |
| US10431432B2 | Plasma treatment system including cover plate to insulate window | Electricity | 0 | Active |
| US10861724B2 | Substrate inspection apparatus and substrate processing system including the same | Electricity | 0 | Active |
| US11715628B2 | Method of forming plasma processing apparatus, related apparatus, and method of forming semiconductor device using the same | Electricity | 0 | Active |
| US11984304B2 | Apparatus and method for plasma etching | Electricity | 0 | Active |
| US11430679B2 | Semiconductor manufacturing apparatus | Electricity | 0 | Active |
| US11215506B2 | Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method | Physics | 0 | Active |
| US10935429B2 | Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method | Physics | 0 | Active |
| US11929239B2 | Plasma processing apparatus and semiconductor device manufacturing method using the same | Electricity | 0 | Active |
| US11450545B2 | Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same | Electricity | 0 | Active |
| US11862440B2 | Semiconductor processing equipment including electrostatic chuck for plasma processing | Electricity | 0 | Active |
| US11092495B2 | Optical emission spectroscopy system, method of calibrating the same, and method of fabricating semiconductor device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.