In-situ light detection methods and apparatus for ultraviolet semiconductor substrate processing
US11215934B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2020 |
| Grant date | Jan 4, 2022 |
| Priority date | — |
| Expiry date | Jul 21, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus for detecting ultraviolet light are provided herein. For example, an ultraviolet (UV) process chamber includes a vacuum window or a transparent showerhead; a UV light source disposed above one of the vacuum window or the transparent showerhead and configured to generate and transmit UV light into a process volume of the UV process chamber; and a first UV sensor configured to measure at least one of emissivity from the UV light source or irradiance of the UV light transmitted into the process volume and to transmit a signal corresponding to a measured at least one of emissivity from the UV light source or irradiance of the UV light to a controller coupled to the UV process chamber during operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.