Cooling apparatus and plasma-cleaning station for cooling apparatus
US11231657B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2018 |
| Grant date | Jan 25, 2022 |
| Priority date | — |
| Expiry date | Jun 7, 2038 |
Classification
- Technology area (CPC —)General
Abstract
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.