System and method for self-cleaning wet treatment process

US11232958B2 · kind B2 · utility

Assignee

• Veeco Instruments Inc. · US

Inventors

• Kenji Nulman · Plainview, US
• Mark Yannuzzi · Plainview, US
• Phillip N. Tyler · Horsham, US
• Jonathan Fijal · Plainview, US
• William Gilbert Breingan · Media, US
• John Taddei · Jim Thorpe, US
• Nicholas Baverov · Plainview, US
• James Swallow · Plainview, US
• Christopher Orlando · Media, US
• Paul Vit · Horsham, US
• Christopher Hofmeister · Menomonee Falls, US
• Tremayne Diggs · Plainview, US

Key dates

• Filing date: Jun 19, 2019
• Grant date: Jan 25, 2022
• Expiry date: Jun 19, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6719
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

An apparatus for supporting and maneuvering a wafer comprises a handle having a gas inlet adapted to couple to a gas supply, a supporting surface coupled to the handle section including a frame structure having edge segments connecting at vertices and spoke elements extending from a center of the frame structure to the vertices, a gas supply channel coupled to the gas inlet that extends from the handle and branches into channels that run through the spoke elements, and a plurality of nozzles positioned at the vertices on the supporting surface and coupled to the channels in the spoke elements. Gas provided to the plurality of nozzles exits the nozzles in a stream directed parallel to the supporting surface and the stream of gas generates forces that enable wafers to be securely supported in a floating manner over the supporting surface without coming into direct contact with the supporting surface.