Patent · US Active

Deposition system with shield mount

US11236415B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Vibhu Jindal · Milpitas, US
Sanjay Bhat · Singapore, SG

Key dates

Filing date	Jun 18, 2019
Grant date	Feb 1, 2022
Priority date	—
Expiry date	Oct 8, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3447
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A deposition system and a method of operation thereof are disclosed. A PVD chamber is disclosed comprising a plurality of cathode assemblies, a rotating shield below the plurality of cathode assemblies to expose one of the plurality cathode assemblies through the shroud and through a shield hole of the shield, the shield comprising a top surface including a raised peripheral frame. A shield mount sized and shaped to engage with the raised peripheral frame to secure the shield mount to the shield.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.