Pedestal lift for semiconductor processing chambers

US11251067B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Brian T. West · San Jose, US
• Miroslav Gelo · Oakley, US
• Yan Rozenzon · Redwood City, US
• Roger M. Johnson · Livermore, US
• Mark William Covington · Edina, US
• Soundarrajan JEMBULINGAM · Bengaluru, IN
• Simon Nicholas Binns · East Palo Alto, US
• Vivek VINIT · Bengaluru, IN

Key dates

• Filing date: Apr 26, 2019
• Grant date: Feb 15, 2022
• Expiry date: Jan 24, 2040

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/332
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Implementations described herein provide a pedestal lift assembly for a plasma processing chamber and a method for using the same. The pedestal lift assembly has a platen configured to couple a shaft of a pedestal disposed in the plasma processing chamber. An absolute linear encoder is coupled to a fixed frame wherein the absolute linear encoder is configured to detect incremental movement of the platen. A lift rod is attached to the platen. A motor rotor encoder brake module (MRBEM) is coupled to the fixed frame and moveably coupled to the lift rod, the motor encoder brake module configured to move the lift rod in a first direction and a second direction, wherein the movement of the lift rod results in the platen traveling vertically relative to the fixed frame.