Patent · US Active

Methods for processing a workpiece using fluorine radicals

US11257680B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignees

Mattson Technology, Inc. · US
Beijing E-Town Semiconductor Technology Co., Ltd. · CN

Inventors

Qi Zhang · State College, US
Xinliang Lu · Fremont, US

Key dates

Filing date	Aug 25, 2020
Grant date	Feb 22, 2022
Priority date	—
Expiry date	Aug 25, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/32137
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Methods for processing a workpiece with fluorine radicals are provided. In one example implementation, the method includes a workpiece having at least one silicon layer and at least one silicon germanium layer. The method can include placing the workpiece on a workpiece support in a processing chamber. The method can include generating one or more species from a process gas in a plasma chamber. The method can include filtering the one or more species to create a filtered mixture. The method can include exposing the workpiece to the filtered mixture to remove at least a portion of the at least one silicon layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.