Method of polishing a new or a refurbished electrostatic chuck
US11260498B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 25, 2014 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Dec 10, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same. In one embodiment, the polishing ring assembly has a retaining ring assembly and an electrostatic chuck fixture. The retaining ring assembly includes an inner diameter and a top surface, a plurality of outer drive rings wherein the plurality of outer drive rings are placed on the top surface of the ceramic retaining ring. The electrostatic chuck fixture includes an electrostatic chuck drive plate adjacent to the inner diameter of in the ceramic retaining ring. The electrostatic chuck drive plate has a lock to secure retaining ring assembly with the electrostatic chuck fixture without transferring the weight from one assembly over to the other through the locking mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.