Cleaning method and substrate processing apparatus
US11264260B2 · kind B2 · utility
0Cited by
2References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 10, 2019 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | May 10, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32706
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.