Takehiro Tanikawa
13Patents
2h-index
25Co-inventors
50Inventor score
Filing activity: Apr 24, 2012 → Mar 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9048070B2 | Dielectric window for plasma treatment device, and plasma treatment device | Electricity | 2 | Active |
| US11257691B2 | Substrate processing apparatus | Electricity | 2 | Active |
| US9111726B2 | Plasma processing apparatus | Electricity | 1 | Active |
| US11984300B2 | Plasma processing apparatus | Electricity | 0 | Active |
| US11264260B2 | Cleaning method and substrate processing apparatus | Electricity | 0 | Active |
| US9595425B2 | Antenna, dielectric window, plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
| US11869750B2 | Plasma processing apparatus | Electricity | 0 | Active |
| US10825662B2 | Method for driving member and processing apparatus | Electricity | 0 | Active |
| US12230483B2 | Deposition method and processing apparatus | Electricity | 0 | Active |
| US9728417B2 | Method for processing base body to be processed | Electricity | 0 | Active |
| US11978614B2 | Substrate processing apparatus | Electricity | 0 | Active |
| US10923328B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
| US9892951B2 | Method of controlling adherence of microparticles to substrate to be processed, and processing apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.