Plasma processing system having an inspection tool and controller that interfaces with a tool model
US11276564B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 23, 2019 |
| Grant date | Mar 15, 2022 |
| Priority date | — |
| Expiry date | Sep 29, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67069
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for use in processing a substrate is provided. One system includes a chamber having an interior region that is exposed to plasma when processing a substrate. The internal region includes surfaces of parts of the chamber. A controller is interfaced with the chamber and includes a detector to enable control of a scope. The scope is configured for insertion into the chamber to inspect the interior region of the chamber without breaking a vacuum of the chamber. The detector includes an optical processor for identifying a characteristic of material present on a surface being inspected via the scope. A tool model processor is configured to receive information regarding the identified characteristic of the material present on the surface and interface with a tool model for the chamber to identify an adjustment to a parameter of a process to be performed using the chamber. The adjustment is configured to compensate for an anticipated drift in the process based on the identified characteristic of the material present on the surface and data from the tool model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.