Inventor · Pleasanton, CA, US

Richard A. Gottscho

54Patents
17h-index
77Co-inventors
87Inventor score

Filing activity: Oct 28, 1988 → Oct 5, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9449793B2 Systems, methods and apparatus for choked flow element extraction Electricity 450 Active
US9778561B2 Vacuum-integrated hardmask processes and apparatus Electricity 349 Active
US5847690A Integrated liquid crystal display and digitizer having a black matrix layer adapted for sensing screen touch location Physics 154 Expired
US6921724B2 Variable temperature processes for tunable electrostatic chuck Electricity 73 Expired
US5002631A Plasma etching apparatus and method Electricity 53 Expired
US5124216A Method for monitoring photoresist latent images Emerging Cross-Sectional Technologies 53 Expired
US6151532A Method and apparatus for predicting plasma-process surface profiles Electricity 43 Expired
US8900402B2 Semiconductor processing system having multiple decoupled plasma sources Electricity 28 Active
US5114233A Method for inspecting etched workpieces Physics 25 Expired
US5413954A Method of making a silicon-based device comprising surface plasma cleaning Emerging Cross-Sectional Technologies 22 Expired
US10831096B2 Vacuum-integrated hardmask processes and apparatus Electricity 22 Active
US10197908B2 Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework Physics 21 Active
US10514598B2 Vacuum-integrated hardmask processes and apparatus Electricity 20 Active
US4902631A Monitoring the fabrication of semiconductor devices by photon induced electron emission Emerging Cross-Sectional Technologies 19 Expired
US9972478B2 Method and process of implementing machine learning in complex multivariate wafer processing equipment Electricity 18 Active
US6632322B1 Switched uniformity control Electricity 17 Expired
US9966231B2 Direct current pulsing plasma systems Emerging Cross-Sectional Technologies 17 Active
US9792393B2 Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization Physics 17 Active
US10041868B2 Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber Electricity 15 Active
US9996647B2 Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization Physics 12 Active
US5179029A Hydrogen plasma passivation of GaAs Emerging Cross-Sectional Technologies 12 Expired
US11209729B2 Vacuum-integrated hardmask processes and apparatus Electricity 11 Active
US10585347B2 Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework Physics 8 Active
US10386828B2 Methods and apparatuses for etch profile matching by surface kinetic model optimization Physics 8 Active
US11276564B2 Plasma processing system having an inspection tool and controller that interfaces with a tool model Electricity 8 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.