Vertical heat treatment apparatus
US11282721B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2019 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Oct 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67309
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vertical heat treatment apparatus includes: a substrate holder including a column, substrate holding parts configured to hold the substrates, and gas flow guide parts installed in the column in a corresponding relationship with the substrates; an elevator stand configured to support the substrate holder and to load the substrate holder into the reaction vessel from below the reaction vessel; a rotating mechanism installed in the elevator stand and configured to rotate the substrate holder about a vertical axis; a process gas supply port and an exhaust port respectively formed at a rear side and a front side of a substrate holding region; and a plurality of baffle parts installed independently of the substrate holder so that the baffle parts protrude from the outside toward spaces between the gas flow guide parts adjoining each other and run into the spaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.