Patent · US Active

Cleaning apparatus and cleaning method of substrate processing apparatus

US11295965B2 · kind B2 · utility

0Cited by

1References

8Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Kohei Yamada · Suwa, JP
Hiroaki Inadomi · Kumamoto, JP
Satoshi Biwa · Kumamoto, JP

Key dates

Filing date	Nov 13, 2018
Grant date	Apr 5, 2022
Priority date	—
Expiry date	Feb 6, 2039

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB08B3/024
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A cleaning apparatus of a substrate processing apparatus according to an exemplary embodiment includes a nozzle and a scanner. The nozzle ejects a gas toward in an inner wall surface of a processing chamber in which a substrate is processed. The scanner causes the nozzle to scan along the inner wall surface of the processing chamber in the processing chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.