Electron microscope apparatus, inspection system using electron microscope apparatus, and inspection method using electron microscope apparatus
US11302513B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Apr 5, 2019 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | Apr 5, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/281
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electron microscope apparatus includes a detection unit that detects reflected electrons reflected from a sample when the sample is irradiated with primary electrons emitted by a primary electron generation unit (electron gun), an image generation unit that generates an image of a surface of the sample with the reflected electrons based on output from the detection unit, and a processing unit that generates a differential waveform signal of the image generated by the image generation unit, processes the image by using information of the differential waveform signal, and measures a dimension of a pattern formed on the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.