Mayuka Osaki
9Patents
2h-index
22Co-inventors
47Inventor score
Filing activity: Jul 15, 2010 → Oct 6, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8671366B2 | Estimating shape based on comparison between actual waveform and library in lithography process | Electricity | 3 | Active |
| US9488815B2 | Pattern evaluation method and pattern evaluation device | Electricity | 2 | Active |
| US11545336B2 | Scanning electron microscopy system and pattern depth measurement method | Electricity | 1 | Active |
| US11355304B2 | Electronic microscope device | Electricity | 0 | Active |
| US11302513B2 | Electron microscope apparatus, inspection system using electron microscope apparatus, and inspection method using electron microscope apparatus | Electricity | 0 | Active |
| US11164720B2 | Scanning electron microscope and calculation method for three-dimensional structure depth | Electricity | 0 | Active |
| US11211226B2 | Pattern cross-sectional shape estimation system and program | Electricity | 0 | Active |
| US12142457B2 | Charged particle beam device | Electricity | 0 | Active |
| US10186399B2 | Scanning electron microscope | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.