Processing apparatus
US11302542B2 · kind B2 · utility
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10Claims
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Assignee
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Key dates
| Filing date | Jan 8, 2020 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | Jan 16, 2040 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF27D2009/007
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A processing apparatus includes: a plurality of process modules concatenated with one another; and a loader module configured to receive a carrier accommodating a plurality of substrates to be processed by the plurality of process modules, wherein each of the plurality of process modules includes: a heat treatment unit including a processing container configured to accommodate the plurality of substrates and perform a heat treatment on the plurality of substrates; and a gas supply unit disposed on one side surface of the heat treatment unit and configured to supply a gas into the processing container.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.