On-chip capacitors in three-dimensional semiconductor devices and methods for forming the same
US11302627B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2020 |
| Grant date | Apr 12, 2022 |
| Priority date | — |
| Expiry date | Oct 21, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/27
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of three-dimensional (3D) semiconductor devices and methods for forming the same are disclosed. In an example, a 3D memory device includes a memory stack, an isolation structure, and a plurality of capacitor contacts. The memory stack includes vertically interleaved conductive layers and first dielectric layers. The isolation structure extends vertically through at least part of the memory stack to electrically separate the conductive layers into gate electrodes in a core array region and capacitor electrodes in a dummy staircase region. The plurality of capacitor contacts are in contact with at least two of the capacitor electrodes in the dummy staircase region, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.