Dual port remote plasma clean isolation valve
US11306824B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2018 |
| Grant date | Apr 19, 2022 |
| Priority date | — |
| Expiry date | Nov 20, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/6028
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device has a body with an inlet opening disposed at a first end coupled to a processing system component such as a remote plasma source and outlet openings, for example two, disposed at a second end which are coupled to a processing system component such as a process chamber. Flaps disposed within the body are actuatable to an open position from a closed position or to a closed position from an open position, to selectively allow or prevent passage of a fluid from the processing system component coupled to the isolation device to the other processing system component coupled thereto.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.