Patent · US Active

Co-integration of bulk and SOI transistors

US11329067B2 · kind B2 · utility

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20Claims
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Key dates

Filing dateJun 11, 2020
Grant dateMay 10, 2022
Priority date
Expiry dateJun 11, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D88/00
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An electronic integrated circuit chip includes a first transistor arranged inside and on top of a solid substrate, a second transistor arranged inside and on top of a layer of semiconductor material on insulator having a first thickness, and a third transistor arranged inside and on top of a layer of semiconductor material on insulator having a second thickness. The second thickness is greater than the first thickness. The solid substrate extends underneath the layers of semiconductor material and is insulated from those layers by the insulator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.