Group VI precursor compounds
US11352383B2 · kind B2 · utility
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8Claims
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Assignee
Inventors
Key dates
| Filing date | Feb 27, 2020 |
| Grant date | Jun 7, 2022 |
| Priority date | — |
| Expiry date | Feb 27, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides a facile process for preparing various Group VI precursor compounds useful in the vapor deposition of such Group VI metals onto solid substrates, especially microelectronic semiconductor device substrates. The process provides an effective means to obtain such volatile materials, which can then be sources of molybdenum, chromium, or tungsten-containing materials to be deposited on such substrates. Additionally, the invention provides a method for vapor deposition of such compounds onto microelectronic device substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.