Conformal stage
US11353800B2 · kind B2 · utility
0Cited by
3References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2018 |
| Grant date | Jun 7, 2022 |
| Priority date | — |
| Expiry date | Dec 21, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/703
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.