J. Casey Donaher
7Patents
2h-index
13Co-inventors
48Inventor score
Filing activity: Sep 6, 1994 → Aug 20, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5483345A | Alignment system for use in lithography utilizing a spherical reflector having a centered etched-on projection object | Physics | 12 | Expired |
| US8395783B2 | System metrology core | Physics | 6 | Active |
| US8760624B2 | System and method for estimating field curvature | Physics | 2 | Active |
| US11126096B2 | System and method for optimizing a lithography exposure process | Physics | 1 | Active |
| US11531279B2 | System and method for optimizing a lithography exposure process | Physics | 0 | Active |
| US9625832B2 | Planar motor system with increased efficiency | Electricity | 0 | Active |
| US11353800B2 | Conformal stage | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.