Christopher J. McLaughlin
3Patents
1h-index
7Co-inventors
30Inventor score
Filing activity: Sep 28, 2018 → Aug 20, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11126096B2 | System and method for optimizing a lithography exposure process | Physics | 1 | Active |
| US11353800B2 | Conformal stage | Physics | 0 | Active |
| US11531279B2 | System and method for optimizing a lithography exposure process | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.