Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
US11358974B2 · kind B2 · utility
0Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2018 |
| Grant date | Jun 14, 2022 |
| Priority date | — |
| Expiry date | Jun 17, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L2203/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.