Mask structure and manufacturing method thereof
US11366381B2 · kind B2 · utility
0Cited by
5References
4Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 26, 2019 |
| Grant date | Jun 21, 2022 |
| Priority date | — |
| Expiry date | Jan 1, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49124
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.