Patent · US Active

Method and apparatus for performing an aerial image simulation of a photolithographic mask

US11366382B2 · kind B2 · utility

0Cited by

0References

21Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
Carl Zeiss SMS Ltd. · IL

Inventors

Vladimir Dmitriev · Moran, IL
Joachim Welte · Speyer, DE
Bernd Geh · Scottsdale, US
Paul Graeupner · Aalen, DE
Anja Schauer · Aalen, DE

Key dates

Filing date	Feb 24, 2020
Grant date	Jun 21, 2022
Priority date	—
Expiry date	Feb 24, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/84
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present invention refers to a method for performing an aerial image simulation of a photolithographic mask which comprises the following steps: (a) modifying an optical radiation distribution at a patterned surface of the photolithographic mask, depending on at least one first arrangement of pixels to be generated in the photolithographic mask; and (b) performing the aerial image simulation of the photolithographic mask by using the generated modified optical radiation distribution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.