Patent · US Active

Mirror, in particular for a microlithographic projection exposure system

US11366395B2 · kind B2 · utility

1Cited by

1References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Kerstin Hild · Schwäbisch Gmünd, DE
Toralf Gruner · Hennef (Sieg), DE
Vitaliy Shklover · Heidenheim, DE

Key dates

Filing date	Nov 8, 2020
Grant date	Jun 21, 2022
Priority date	—
Expiry date	Dec 9, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/062
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror that has a mirror substrate (12), a reflection layer stack (21) reflecting electromagnetic radiation incident on the optical effective surface (11), and at least one piezoelectric layer (16) arranged between the mirror substrate and the reflection layer stack and to which an electric field for producing a locally variable deformation is applied by way of a first electrode arrangement and a second electrode arrangement situated on alternate sides of the piezoelectric layer. In one aspect, both the first and the second electrode arrangements have a plurality of electrodes (20a, 20b), to each of which an electrical voltage relative to the respective other electrode arrangement can be applied via leads (19a, 19b). Separate mediator layers (17a, 17b) set continuous electrical potential profiles along the respective electrode arrangement, and where said mediator layers differ from one another in their average electrical resistance by a factor of at least 1.5.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.