Patent · US Active

On-the-fly scatterometry overlay metrology target

US11378394B1 · kind B1 · utility

4Cited by

9References

24Claims

0Family size

Assignee

KLA Corporation · US

Inventors

Yuri Paskover · Or Akiva, IL
Itay Gdor · Elyachin, IL
Yuval Lubashevksy · Milpitas, US
Vladimir Levinski · Milpitas, US
Alexander Volfman · Milpitas, US
Yoram Uziel · Yodfat, IL

Key dates

Filing date	Dec 11, 2020
Grant date	Jul 5, 2022
Priority date	—
Expiry date	Dec 11, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70683
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.