Lithography system with an embedded cleaning module
US11378894B2 · kind B2 · utility
0Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2019 |
| Grant date | Jul 5, 2022 |
| Priority date | — |
| Expiry date | Oct 28, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70741
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.