Jui-Ching Wu
16Patents
3h-index
28Co-inventors
52Inventor score
Filing activity: Sep 22, 2011 → Oct 28, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9140987B2 | Method for lithography patterning | Electricity | 6 | Active |
| US8563231B2 | Patterning process and materials for lithography | Physics | 4 | Active |
| US10459353B2 | Lithography system with an embedded cleaning module | Physics | 4 | Active |
| US9229326B2 | Method for integrated circuit patterning | Electricity | 3 | Active |
| US10559171B2 | Electronic system sharing power with doorbell and power-supply method thereof | Electricity | 2 | Active |
| US10067418B2 | Particle removal system and method thereof | Performing Operations; Transporting | 2 | Active |
| US9665007B2 | Rotary EUV collector | Physics | 1 | Active |
| US9046776B2 | System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle | Physics | 1 | Active |
| US9429858B2 | Rotary EUV collector | Physics | 1 | Active |
| US9558944B2 | System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle | Physics | 1 | Active |
| US9412632B2 | Reticle pod | Electricity | 1 | Active |
| US10274838B2 | System and method for performing lithography process in semiconductor device fabrication | Physics | 0 | Active |
| US10976672B2 | System and method for performing lithography process in semiconductor device fabrication | Physics | 0 | Active |
| US10685846B2 | Semiconductor integrated circuit fabrication with pattern-reversing process | Electricity | 0 | Active |
| US9159559B2 | Lithography layer with quenchers to prevent pattern collapse | Electricity | 0 | Active |
| US11378894B2 | Lithography system with an embedded cleaning module | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.