Enviromentally stable, thick film, chemically amplified resist
US11385543B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2017 |
| Grant date | Jul 12, 2022 |
| Priority date | — |
| Expiry date | Sep 4, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Environmentally stable, chemically amplified (CA) positive resist compositions are described. These resist compositions are based on a blend of at least two types of polymer platforms. The first platform is a low activation energy, acetal blocked polyhydroxystyrene (PHS) based resin; the second platform is an acrylate based resin containing a high activation energy acid labile group [such as tertiary-butyl acrylate(t-BA)]. The resist composition also contains a photo-acid generator (PAG), a base quencher, a surfactant dissolved in a suitable solvent. Also described, is the use of these resist composition in a method for forming a photoresist relief image on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.