Method and apparatus to determine a patterning process parameter
US11409204B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | May 22, 2020 |
| Grant date | Aug 9, 2022 |
| Priority date | — |
| Expiry date | Jun 7, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.