Phase-change memory with insulated walls
US11411177B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 20, 2020 |
| Grant date | Aug 9, 2022 |
| Priority date | — |
| Expiry date | May 20, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N70/8413
Abstract
The present disclosure concerns a phase-change memory manufacturing method and a phase-change memory device. The method includes forming a first insulating layer in cavities located vertically in line with strips of phase-change material, and anisotropically etching the portions of the first insulating layer located at the bottom of the cavities; and a phase-change memory device including a first insulating layer against lateral walls of cavities located vertically in line with strips of phase-change material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.