Patent · US Active

Phase-change memory with insulated walls

US11411177B2 · kind B2 · utility

1Cited by
1References
10Claims
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Key dates

Filing dateMay 20, 2020
Grant dateAug 9, 2022
Priority date
Expiry dateMay 20, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/8413

Abstract

The present disclosure concerns a phase-change memory manufacturing method and a phase-change memory device. The method includes forming a first insulating layer in cavities located vertically in line with strips of phase-change material, and anisotropically etching the portions of the first insulating layer located at the bottom of the cavities; and a phase-change memory device including a first insulating layer against lateral walls of cavities located vertically in line with strips of phase-change material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.