Compensation of creep effects in an imaging device

US11415895B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Marwene Nefzi · Ulm, DE
• Ralf Zweering · Aalen, DE
• Toralf Gruner · Hennef (Sieg), DE

Key dates

• Filing date: Jun 22, 2021
• Grant date: Aug 16, 2022
• Expiry date: Jun 22, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70825
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports at least one optical element of the imaging device via an active relative situation control device of a control device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device of the control device. The measuring device is connected to the relative situation control device. The measuring device outputs to the relative situation control device measurement information representative for the position and/or the orientation of the at least one optical element in relation to a reference in at least one degree of freedom in space.