Method of manufacturing a charged particle detector
US11417498B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2020 |
| Grant date | Aug 16, 2022 |
| Priority date | — |
| Expiry date | Jul 15, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2447
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method of manufacturing a charged particle detector, comprising the steps of providing a sensor device, such as an Active Pixel Sensor (APS). Said sensor device at least comprises a substrate layer and a sensitive layer. The method further comprises the step of providing a mechanical supporting layer and connecting said mechanical supporting layer to said sensor device. After connection, the sensitive layer is situated in between said substrate layer and said mechanical supporting layer. By connecting the mechanical supporting layer, it is possible to thin said substrate layer for forming said charged particle detector. The mechanical supporting layer forms part of the manufactured detector. The detector can be used in a charged particle microscope, such as a Transmission Electron Microscope for direct electron detection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.