EUV radiation modification methods and systems
US11419203B2 · kind B2 · utility
1Cited by
12References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2021 |
| Grant date | Aug 16, 2022 |
| Priority date | — |
| Expiry date | Feb 8, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method and system for generating EUV light includes providing a laser beam having a Gaussian distribution. This laser beam can be then modified from a Gaussian distribution to a ring-like distribution. The modified laser beam is provided through an aperture in a collector and interfaces with a moving droplet target, which generates an extreme ultraviolet (EUV) wavelength light. The generated EUV wavelength light is provided to the collector away from the aperture. In some embodiments, a mask element may also be used to modify the laser beam to a shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.