Patent · US Active

Surface topography measurement apparatus and method

US11422096B2 · kind B2 · utility

4Cited by

2References

12Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Weimin Li · Lo Wu, CN
Wen Xiao · Shanghai, CN
Vibhu Jindal · Milpitas, US
Sanjay Bhat · Singapore, SG

Key dates

Filing date	Nov 30, 2020
Grant date	Aug 23, 2022
Priority date	—
Expiry date	Nov 30, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/95676
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Apparatus and methods for measuring surface topography are described. The analysis apparatus and methods detect light reflected from the reflective backside of a cantilever assembly including a tip, calculate a background level (BGL) value obtained from an optical scan of a reference sample using a power spectral density (PSD) value obtained from a topographical scan of a reference sample to generate a correlational coefficient between the BGL and the PSD values. The correlational coefficient between the BGL and PSD values is used to measure the BGL value of additional EUV mask blanks by a topographical scan of the EUV mask blanks using the same tip mounted to the cantilever.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.