Quantification of processing chamber species by electron energy sweep
US11430643B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2020 |
| Grant date | Aug 30, 2022 |
| Priority date | — |
| Expiry date | Sep 29, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/421
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system includes a plasma chamber configured to contain a plasma, a shutter chamber fluidically coupled to the plasma chamber via a first orifice, a mass spectrometer fluidically coupled to the shutter chamber, and a shutter disposed in the shutter chamber between the first orifice and the mass spectrometer in the path of a particle beam. The first orifice is configured to generate the particle beam from the plasma using a pressure differential between the shutter chamber and the plasma chamber. The mass spectrometer includes an ionizer configured to ionize species of the particle beam by sweeping through a range of electron energies in a plurality of energy steps. The shutter is configured to open and close during each of the plurality of energy steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.