Peter Ventzek
60Patents
6h-index
38Co-inventors
72Inventor score
Filing activity: Apr 12, 1999 → May 22, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10998169B2 | Systems and methods of control for plasma processing | Electricity | 40 | Active |
| US10991554B2 | Plasma processing system with synchronized signal modulation | Electricity | 40 | Active |
| US8889534B1 | Solid state source introduction of dopants and additives for a plasma doping process | Electricity | 38 | Active |
| US6165567A | Process of forming a semiconductor device | Chemistry; Metallurgy | 18 | Expired |
| US6139696A | Method and apparatus for forming a layer on a substrate | Electricity | 10 | Expired |
| US8636871B2 | Plasma processing apparatus, plasma processing method and storage medium | Electricity | 10 | Active |
| US6500315B1 | Method and apparatus for forming a layer on a substrate | Electricity | 6 | Expired |
| US11430643B2 | Quantification of processing chamber species by electron energy sweep | Electricity | 4 | Active |
| US11295937B2 | Broadband plasma processing systems and methods | Electricity | 3 | Active |
| US11348761B2 | Impedance matching apparatus and control method | Electricity | 3 | Active |
| US11170981B2 | Broadband plasma processing systems and methods | Electricity | 2 | Active |
| US11094543B1 | Defect correction on metal resists | Electricity | 2 | Active |
| US11342195B1 | Methods for anisotropic etch of silicon-based materials with selectivity to organic materials | Electricity | 2 | Active |
| US11393663B2 | Methods and systems for focus ring thickness determinations and feedback control | Electricity | 1 | Active |
| US11056347B2 | Method for dry etching compound materials | Emerging Cross-Sectional Technologies | 1 | Active |
| US11251021B2 | Mode-switching plasma systems and methods of operating thereof | Electricity | 1 | Active |
| US11264212B1 | Ion angle detector | Electricity | 1 | Active |
| US11605536B2 | Cyclic low temperature film growth processes | Electricity | 1 | Active |
| US11830709B2 | Broadband plasma processing systems and methods | Electricity | 1 | Active |
| US11201035B2 | Radical source with contained plasma | Electricity | 1 | Active |
| US9252001B2 | Plasma processing apparatus, plasma processing method and storage medium | Electricity | 1 | Active |
| US11393662B2 | Apparatuses and methods for plasma processing | Electricity | 0 | Active |
| US12014901B2 | Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma | Electricity | 0 | Active |
| US11557487B2 | Etching metal during processing of a semiconductor structure | Electricity | 0 | Active |
| US10340137B2 | Monolayer film mediated precision film deposition | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.