Patent · US Active

Sequential infiltration synthesis apparatus and a method of forming a patterned structure

US11447861B2 · kind B2 · utility

2Cited by

2,218References

13Claims

0Family size

Assignee

ASM IP Holding B.V. · NL

Inventors

Jan Willem Maes · Wilrijk, BE
Werner Knaepen · Leuven, BE
Krzysztof Kamil Kachel · Leuven, BE
David Kurt de Roest · Kessel-Lo, BE
Bert Jongbloed · Oud-Heverlee, BE
Dieter Pierreux · Dilbeek, BE

Key dates

Filing date	Dec 15, 2016
Grant date	Sep 20, 2022
Priority date	—
Expiry date	Dec 15, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/0337
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A sequential infiltration synthesis apparatus comprising:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.