Metrology parameter determination and metrology recipe selection
US11448974B2 · kind B2 · utility
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22Claims
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Key dates
| Filing date | Mar 22, 2021 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Mar 22, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of determining a patterning process parameter from a metrology target, the method including: obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target; and using the combination of values to determine a same value of the patterning process parameter for the target.
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